YUANGKAEW, T.; PONCHIO, C.; NUCHUAY, P.; PATTHANASETTAKUL, V.; EIAMCHAI, P.; NUNTAWONG , N.; HORPRATHUM, M.; LIMWICHEAN*, S. The Effect of Annealing Treatment on WO3 Thin Film Prepared by Reactive DC Magnetron Sputtering for Photo-electrochemical Water Splitting Application. CURRENT APPLIED SCIENCE AND TECHNOLOGY, Bangkok, Thailand, v. 26, n. 1, p. DOI: 10.55003/cast.2023.06.23.010 (10 pages), 2023. DOI: 10.55003/cast.2023.06.23.010. Disponível em: https://li01.tci-thaijo.org/index.php/cast/article/view/255926. Acesso em: 6 dec. 2025.