INTHISANG, S.; SRIPRAPHA, K. Effect of Dopant Gas Sources on the Properties of Boron Doped p-a-Si1-xOx:H Films and Their Application to a-Si1-xOx:H Thin Film Solar Cells. CURRENT APPLIED SCIENCE AND TECHNOLOGY, Bangkok, Thailand, v. 25, n. 6, p. e0265240, 2025. DOI: 10.55003/cast.2025.265240. Disponível em: https://li01.tci-thaijo.org/index.php/cast/article/view/265240. Acesso em: 9 dec. 2025.