THE EFFECT OF N2 FLOW RATE TO PROPERTY OF (Cr-Al-Nb-Si-V)N FILM BY SPUTTERING TECHNIQUE
Keywords:
Nitride film, Metallic glass film, SputteringAbstract
This research aimed to study the chemical and physical properties of (Cr-Al-Nb-Si-V)N films deposited with varying nitrogen gas flow rates ranging from 0 to 5 sccm using the sputtering method. The results indicated that the nitrogen gas flow rate significantly affects the film’s morphology and crystal structure. At 0 sccm nitrogen gas flow rate, the film’s surface was smooth and the crystal structure exhibited an amorphous. However, when the nitrogen gas flow rate is increased to 1-5 sccm, the film surface shows obvious grains with sizes ranging from 16.6±2.9 to 42.0±5.1 nanometers, respectively. At a nitrogen gas flow rate of 5 sccm, the crystal structure exhibits a polycrystalline. All films showed the element composition with Cr as the predominant element. The hardness and modulus properties are also notably influenced by the change in nitrogen gas flow rates. At nitrogen gas flow rates between 0 and 3 sccm, the films exhibited average hardness values ranging from 10.4±0.8 to 11.8±0.4 GPa and average modulus values ranging from 145.7±13.7 to 157.3±5.8 GPa. These values were lower than those of the films deposited at a nitrogen gas flow rate of 5 sccm, where the average hardness is 14.7±0.8 GPa and the average modulus is 181.1±4.2 GPa. This demonstrated that when the crystal structure of the film was changed from amorphous to polycrystalline, the hardness and modulus values were increased.
References
Aissani, L., Alhussein, A., Zia, A.W., Mamba, G., & Rtimi, S. (2022). Magnetron Sputtering of Transition Metal Nitride Thin Films for Environmental Remediation. Coatings, 12, 1746
Chao, R., Cai, H., Li, H., & Xue, Y. (2022). Effect of Nitrogen Flow Rate on Microstructure and Optical Properties of Ta2 O5 Coatings. Coatings, 12, 1745.
Feng, C., Feng, X., Guan, Z., Song, H., Wang, T., Liao, W., Lu, Y., & Zhang, F. (2022). Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance. Nanomaterials, 12, 2722.
Kowong, R., Denchitcharoen, S., Lertvanithphol, T., Triamnak, N., Chananonnawathorn, C., Lohwong Watana, B., Chaiprapa, J., Songsiriritthigul, C., Treetong, A., Klamchuen, A., Songsiriritthigul, P., Muthitamongkol, P., Chia, J.Y., Jaruwongrungsee, K., Nuntawong, N., & Horprathum, M. (2023). Structural and mechanical behavior of Zr-W-Ti thin film metallic glasses prepared by multitarget co-magnetron sputtering. Journal of Alloys and Compounds, 936, 168330.
Lee, J., Tung, H.C., & Duh, J.G. (2015). Enhancement of mechanical and thermal properties in Zr–Cu–Ni–Al–N thin film metallic glass by compositional control of nitrogen. Materials Letters, 159, 369-372.
Li, C.L., Chung, C.Y., Lou, B.S., Lee, J.W., & Chu, J.P. (2017). Effect of Nitrogen Content on the Corrosion Resistance of Zr-Ni-Al-Si Thin Film Metallic Glass, International Journal of Electrochemical Science, 12(12), 12074-12083.
Li, Z., Zhang, Y., Wang, Y., Li, J., & Zhao, H. (2021). Effect of Nitrogen Flow Ratio on Degradation Behaviors and Failure of Magnetron Sputter Deposited Tantalum Nitride. Coatings, 11, 1133.
Ma, X., Sun, K., Li, P., Zhang, N., Wang, Q., & Wang, G. (2021). Enhanced Mechanical Properties of Metallic Glass Thin Films via Modification of Structural Heterogeneity. Materials, 14(4), 999.
Nguyen, T.A.K., Dang, N.M., Lin, C.-H., Lee, M.-C., Wang, Z.-Y., Tsai, Y.-C., & Lin, M.-T. (2023). Effects of RF Magnetron Sputtering Power on the Mechanical Behavior of Zr-Cu-Based Metallic Glass Thin Films. Nanomaterials, 13, 2677.
Sharma, A., & Zadorozhnyy, V. (1933). Review of the Recent Development in Metallic Glass and Its Composites. Metals, 11(12), 11121933.
Rajan, S.T., & Arockiarajan, A. (2021). Thin film metallic glasses for bioimplants and surgical tools: A review, Journal of Alloys and Compounds, 876, 159939.
Wang, W. H., Dong, C., & Shek, C. H. (2004). Bulk Metallic Glasses. Materials Science and Engineering, 44, 45-89.
Wang, Y. (2016). Engineering Si-Compatible Materials Based on Transparent Nitrides and Conductive Oxides (Tncos) for Broadband Active Plasmonics and Metamaterials Applications. (Doctoral dissertation). Boston University, Boston, MA.
Yiu, P., Diyatmika, W., Bönninghoff, N., Lu, Y.C., Lai, B.Z., & Chu, J.P. (2020). Thin film metallic glasses: Properties, applications and future. Journal of Applied Physics, 127(3), 030901.
Zhang, Y., Yan, X.-H., Liao, W.-B., & Zhao, K. (2018). Effects of Nitrogen Content on the Structure and Mechanical Properties of (Al0.5CrFeNiTi0.25)Nx High-Entropy Films by Reactive Sputtering. Entropy, 20, 624.
Downloads
Published
Issue
Section
License
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
โปรดกรอกเอกสารและลงนาม "หนังสือรับรองให้ตีพิมพ์บทความในวารสารวิจัยมหาวิทยาลัยราชภัฏพระนคร สาขาวิทยาศาสตร์และเทคโนโลยี" ก่อนการตีพิมพ์
