Energy Distribution Functions of Ions Generated by a Circular-type Anode Layer Ion Source
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Abstract
An anode layer ion source, or an ALIS, is classified as a gridless ion source that produces a high-energy ion beam for either surface etching or thin film deposition. In the present work, the energy distribution functions of the ions generated in a circular ALIS were measured using a retarding field energy analyzer (RFA). Consequently, the average density and energy of the ions arriving at the ground surface were determined for the given range of process parameters. The IEDFs show two different groups of ions, namely, a narrow low energy group and a broad high energy group. The low-energy ions are probably generated in the background plasma and accelerated via the cathode sheath adjacent to the RFA. High-energy ions, on the other hand, are possibly generated in the discharge channel and gain an energy of up to 0.7eVanode through the anode sheath. The variations in average ion energies and densities as a function of process conditions could be due to the potential profile between the source and the ground surface.
Keywords: ion energy distribution function; retarding field energy analyzer; anode layer ion source; anode sheath; cathode sheath
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References
Abolmasov, S.N., 2012. Physics and engineering of crossed-field discharge devices. Plasma Sources Science and Technology, 21(3), DOI: 10.1088/0963-0252/21/3/035006.
Anders, A., 2005. Plasma and ion sources in large area coating: A review. Surface and Coatings Technology, 200(5-6), 1893-1906.
Zhurin, V.V., 2012. Industrial Ion Sources: Broadbeam Gridless Ion Source Technology. Weinheim: WILEY-VCH.
Dudnikov, V. and Westner, A., 2002. Ion source with closed drift anode layer plasma acceleration. Review of Scientific Instruments, 73(2), 729-731.
Lee, S., Byun, E.-Y., Kim, J.-K. and Kim, D.-G., 2014. Ar and O-2 linear ion beam PET treatments using an anode layer ion source. Current Applied Physics, 14, S180-S182.
Scheer, H.C., 1992. Ion sources for dry etching: Aspects of reactive ion beam etching for Si technology (invited)a). Review of Scientific Instruments, 63(5), 3050-3057, DOI: 10.1063/1. 1142605.
Qasim, A.M., Ali, F., Wu, H., Fu, R.K.Y., Xiao, S., Li, Y., Wu, Z. and Chu, P.K., 2019. Effects of ion flux density and energy on the composition of TiNx thin films prepared by magnetron sputtering with an anode layer ion source. Surface and Coatings Technology, 365, 58-64.
Qasim, A.M., Ali, F., Wu, H., Fu, R.K.Y., Xiao, S., Li, Y., Wu, Z. and Chu, P.K., 2019. Enhanced mechanical and electrochemical properties of TiNx thin films prepared by magnetron sputtering with an anode layer ion source. Surface and Coatings Technology, 365, 253-260.
Qasim, A.M., Ruan, Q., Fu, R.K.Y., Ali, F., Mehrjou, B., Wu, H., Liu, L., Wu, Z. and Chu, P.K., 2019. Enhanced oxygen-induced properties of bulk oxygenated amorphous carbon films deposited with an anode layer ion source. Vacuum, 169, DOI: 10.1016/j.vacuum. 2019.108915.
Kahn, M., Čekada, M., Schöberl, T., Berghauser, R., Mitterer, C., Bauer, C., Waldhauser, W. and Brandstätter, E., 2009. Structural and mechanical properties of diamond-like carbon films deposited by an anode layer source. Thin Solid Films, 517(24), 6502-6507.
Kim, W.R., Park, M.S., Jung, U.C., Kwon, A.R., Kim, Y.W., Chung, W.S., 2014. Effect of voltage on diamond-like carbon thin film using linear ion source. Surface and Coatings Technology, 243, 15-19.
Tian, S., Xu, F., Ye, P., Wu, J., Zou, Y. and Zuo, D., 2018. Deposition of cubic boron nitride films by anode layer linear ion source assisted radio frequency magnetron sputtering. Thin Solid Films, 653, 13-18.
Murmu, P.P., Markwitz, A., Suschke, K. and Futter, J., 2014. A novel radial anode layer ion source for inner wall pipe coating and materials modification-Hydrogenated diamond-like carbon coatings from butane gas. Review of Scientific Instruments, 85(8), DOI: 10.1063/1.4892813.
Tang, D.L., Pu, S.H., Wang, L.S., Qiu, X.M. and Chu, P.K., 2005. Linear ion source with magnetron hollow cathode discharge. Review of Scientific Instruments, 76(11), DOI: 10.1063/1.2130933.
Lee, S., Kim, J.-K. and Kim, D.-G., 2012. Effects of electrode geometry on the ion beam extraction of closed drift type anode layer linear ion source. Review of Scientific Instruments, 83(2), DOI: 10.1063/1.3665961.
Anders, A., 2010. A structure zone diagram including plasma-based deposition and ion etching. Thin Solid Films, 518(15), 4087-4090.
Meškinis, Š., Kopustinskas, V., Tamulevičienė, A., Tamulevičius, S., Niaura, G., Jankauskas, J. and Gudaitis, R., 2010. Ion beam energy effects on structure and properties of diamond like carbon films deposited by closed drift ion source. Vacuum, 84(9), 1133-1137.
Park, D.-H., Kim, J.-H., Ermakov, Y. and Choi, W.-K., 2008. Linear ion source with closed drift and extended acceleration region. Review of Scientific Instruments, 79(2), DOI: 10.1063/ 1.2821507.
Ide-Ektessabi, A., Yasui, N. and Okuyama, D., 2002. Characteristics of an ion beam modification system with a linear ion source. Review of Scientific Instruments, 73(2), 873-876.
Benedikt, J., Kersten, H. and Piel, A., 2021. Foundations of measurement of electrons, ions and species fluxes toward surfaces in low-temperature plasmas. Plasma Sources Science and Technology, 30(3), DOI: 10.1088/1361-6595/abe4bf.
Böhm, C. and Perrin, J., 1993. Retarding‐field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in low‐pressure radio frequency discharges. Review of Scientific Instruments, 64(1), 31-44, DOI: 10.1063/1.1144398.
Murmu, P.P., Markwitz, A., Suschke, K. and Futter, J., 2014. A novel radial anode layer ion source for inner wall pipe coating and materials modification-Hydrogenated diamond-like carbon coatings from butane gas. Review of Scientific Instruments, 85(8), DOI: 10.1063/ 1.4892813.
Dorf, L., Raitses, Y. and Fisch, N.J., 2005. Experimental studies of anode sheath phenomena in a Hall thruster discharge. Journal of Applied Physics, 97(10), DOI: 10.1063/1.1915516.
Barnat, E.V., Laity, G.R. and Baalrud, S.D., 2014. Response of the plasma to the size of an anode electrode biased near the plasma potential. Physics of Plasmas, 21(10), DOI: 10.1063/ 1.4897927.
Chauhan, S., Ranjan, M., Bandyopadhyay, M. and Mukherjee, S., 2016. Droplet shaped anode double layer and electron sheath formation in magnetically constricted anode. Physics of Plasmas, 23(1), DOI: 10.1063/1.4939029.
Lee, J.K., Babaeva, N.Y., Kim, H.C., Manuilenko, O.V. and Shon, J.W., 2004. Simulation of capacitively coupled single- and dual-frequency RF discharges. IEEE Transactions on Plasma Science, 32(1), 47-53, DOI: 10.1109/TPS.2004.823975.