Oxidation Behavior of Nanostructure Sputtered Titanium Nitride Thin Films

Article Sidebar

pdf
Published: Apr 28, 2022
DOI: https://doi.org/10.55003/cast.2022.06.22.015
Keywords:
thermal oxidation; TiN; magnetron sputtering

Main Article Content

Adisorn Buranawong
Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand
Nirun Witit- Anun*
Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand

Abstract

The oxidation behavior of reactive DC magnetron sputtered TiN thin films was investigated under annealing temperature ranging from 400 to 700oC in the ambient atmosphere using X-ray diffraction, energy dispersive X-ray spectroscopy, and field-emission scanning electron microscopy techniques. The oxidation rate and oxidation activation energy of the films were also calculated from parabolic and Arrhenius relations. The as-deposited film had a polycrystalline TiN structure. After annealing at 450oC, the TiO2 rutile structure was found in the XRD spectra and the relative integrated intensity of the oxide phase increased gradually with temperature. The EDS analysis gave confirmation of XRD patterns, showing the expected increase in O content. Grain growth resulting from grain coalescence occurred through the annealing temperatures. The cross-sectional analysis showed that a very thin dense oxide overlayer was present at 400°C and the oxide thickness increased gradually with temperature. Moreover, the films were fully oxidized into a porous structure after 650oC. The results revealed that the films showed an oxidation rate from 400°C and the oxidation activation energy of films was 156.56 kJ/mol.

Keywords: thermal oxidation; TiN; magnetron sputtering


*Corresponding author: Tel.: (+66) 38103084 Fax: (+66) 38103084


                                             E-mail: nirun@buu.ac.th

Article Details

Issue
Vol. 22 No. 6 (2022)
Section
Original Research Articles
Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Copyright Transfer Statement

 The copyright of this article is transferred to Current Applied Science and Technology journal with effect if and when the article is accepted for publication. The copyright transfer covers the exclusive right to reproduce and distribute the article, including reprints, translations, photographic reproductions, electronic form (offline, online) or any other reproductions of similar nature.

 The author warrants that this contribution is original and that he/she has full power to make this grant. The author signs for and accepts responsibility for releasing this material on behalf of any and all co-authors.

Here is the link for download: Copyright transfer form.pdf

 

 

Crossref
Scopus
Google Scholar
Europe PMC

References

Wushuer, M., Xiaerding, F., Mamat, M., Xu, Ma., Mijiti, A. and Aihaiti, L., 2020. Influence of Mn doping on structural, optical, and magnetic properties of BiFeO3 films fabricated by the sol-gel method. Science Asia, 46, 330-335.

Sun, N., Xu, J., Zhou, D., Zhao, P., Li, S., Wang, J., Chu, S. and Ali, F., 2018. DC reactively sputtered TiNx thin films for capacitor electrodes. Journal of Materials Science: Materials in Electronics, 29, 10170-10176.

Wu, W.Y., Chan, M.Y., Hsu, Y.H., Chen, G.Z. Liao, S.C. Lee, C.H. and Lui, P.W., 2019. Bio application of TiN thin films deposited using high power impulse magnetron sputtering. Surface and Coatings Technology, 362, 167-175.

Yi, P., Zhu, L., Dong, C. and Xiao, K., 2019 Corrosion and interfacial contact resistance of 316L stainless steel coated with magnetron sputtered ZrN and TiN in the simulated cathodic environment of a proton-exchange membrane fuel cell. Surface and Coatings Technology, 198-202.

Yang, J., Peng, M., Liao, J., Yang, Y. and Liu, N., 2017. Effect of N2 gas injection parameters on structure and properties of TiN thin films prepared by reactive gas pulse sputtering. Surface and Coatings Technology, 311, 391-397.

Bejaxhin, A.B.H. and Paulraj, G., 2019. Experimental investigation of vibration intensities of CNC machining centre by microphone signals with the effect of TiN/epoxy coated tool holder. Journal of Mechanical Science and Technology, 33, 1321-1331.

Kıvak, T., Sarıkay, M., Yıldırım, Ç.V. and Şirin, Ş., 2020. Study on turning performance of PVD TiN coated Al2O3+TiCN ceramic tool under cutting fluid reinforced by nano-sized solid particles. Journal of Manufacturing Processes, 56, 522-539.

Ichimura, H. and Kawana, A., 1993. High-temperature oxidation of ion-plated TiN and TiAlN films. Journal of Materials Research, 8, 1093-1100.

Avasarala, B. and Haldar, P., 2010. Electrochemical oxidation behavior of titanium nitride based electrocatalysts under PEM fuel cell conditions. Electrochimica Acta, 55, 9024-9034.

Montero, I., Jiménez, C. and Perrière, J., 1991. Surface oxidation of TiNx films. Surface Science, 251-252, 1038-1043.

Logothetidis, S., Meletis, E.I., Stergioudis, G. and Adjaottor, A.A., 1999. Room temperature oxidation behavior of TiN thin films. Thin Solid Films, 388, 304-313.

Chen, H.-Y. and Lu, F.-H. 2005. Oxidation behavior of titanium nitride films. Journal of Vacuum Science and Technology A, 23, 1006-1009.

Aliaj, F., Syla, N., Oettel, H. and Dilo, T., 2016. Thermal treatment in air of direct current (DC) magnetron sputtered TiN coatings. Scientific Research and Essays, 11, 230-238.

Chim, Y.C., Ding, X.Z., Zeng, X.T. and Zhang, S., 2009. Oxidation resistance of TiN, CrN, TiAlN and CrAlN coatings deposited by lateral rotating cathode arc. Thin Solid Films, 517, 4845-4849.

Fateh, N., Fontalvo, G.A., Gassner, G. and Mitterer, C., 2009. Influence of high-temperature oxide formation on the tribological behaviour of TiN and VN coatings. Wear, 262, 1152-1158.

Glaser, A., Surnev, S., Netzer, F.P., Fateh, N., Fontalvo, G.A. and Mitterer, C., 2007. Oxidation of vanadium nitride and titanium nitride coatings. Surface Science, 601, 1153-1159.

Qi, Z.B., Liu, B., Wu, Z.T., Zhu, F.P., Wang, Z.C. and Wu, C.H., 2013. A comparative study of the oxidation behavior of Cr2N and CrN coatings. Thin Solid Films, 544, 515-520.

Jafari, A., Ghoranneviss, Z., Elahi, A.S., Ghoranneviss, M., Yazdi, N.F. and Rezaei, A., 2014. Effect of annealing on TiN thin films growth by DC magnetron sputtering. Advance in Mechanical Engineering, 2014, 1-6.

Hones, P., Zakri, C., Schmid, P.E., Lévy, F. and Shojaei, O.R., 2000. Oxidation resistance of protective coatings studied by spectroscopic ellipsometry. Thin Solid Films, 76, 3194-3196.

Sabitzer, C., Steinkellner, C., Koller, C.M., Polcik, P., Rachbauer, R. and Mayrhofer, P.H., 2015. Diffusion behavior of C, Cr, and Fe in arc evaporated TiN- and CrN-based coatings and their influence on thermal stability and hardness. Surface and Coatings Technology, 275, 185-192.

Otani, Y. and Hofmann, S., 1996. High temperature oxidation behaviour of (Ti1-xCrxN) coatings. Surface and Coatings Technology, 287, 188-192.