Structure of Titanium Nitride Coatings on Stainless Steel 304
Keywords:
microstructure, TiN, thin films, X –ray diffractionAbstract
The microstructure of TiN films deposited by magnetron sputtering are related to their properties and deposition conditions. The transition from porous to compact films and the change in their microhardness, lettice parameters and gas pressure and energy of ion bombardment. The extended crystallographic anisotropy of inhomogeneous lattice deformations is a new phenomenon in which thin polycrystalline films differ from bulk stress-free materials.
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online 2452-316X print 2468-1458/Copyright © 2022. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/),
production and hosting by Kasetsart University of Research and Development Institute on behalf of Kasetsart University.