Effect of total pressure on the structure and hydrophilic property of TiO2 thin film prepared by reactive DC magnetron sputtering method
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Abstract
Titanium dioxide (TiO2) films were deposited on Si and glass slides by reactive DC magnetron sputtering method. The effect of the total pressure, in the range of 3.0×10-3 - 1.1×10-2 mbar, on the structure of the film was investigated. The crystal structure was characterized by GIXRD technique. The microstructure, surface morphology and thickness were evaluated by FE-SEM technique. The optical transmittance was measured by UV-VIS spectrophotometer. The hydrophilic property was evaluated from contact angle after UV illumination. The results revealed that the structure and hydrophilicity were influence by total pressure. The as-deposited films were transparent and had high transmittance in visible regions. The thin film was titanium dioxide with the mixed phase of rutile and anatase structure. The phase transition from pure rutile to the mixed phase of anatase/rutile and pure anatase was observed with increasing of the total pressure. The thickness was in the range of 113 nm to 149 nm. The crystal size increased from 15.40 nm to 65.10 nm, with increasing of the total pressure. The refractive index (n) was in the range of 2.30-2.50. The energy band gap (Eg) was in the range of 3.29 eV to 3.42 eV. The thin film with pure anatase phase showed the contact angle of 0o after exposure to the UV. This exhibited clearly superhydrophilic property of the film.
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Published manuscript are the rights of their original owners and RMUTSB Academic Journal. The manuscript content belongs to the authors' idea, it is not the opinion of the journal's committee and not the responsibility of Rajamangala University of Technology Suvarnabhumi
References
Babelon, P., Dequiedt, A. S., Mostéfa-Sba, H., Bourgeois, S., Sibillot, P., & Sacilotti, M. (1998). SEM and XPS studies of titanium dioxide thin films grown by MOCVD. Thin Solid Films, 322, 63-67.
Brady, G. S., & Clauser, H. R. (1991). Materials handbook. New York: McGraw-Hill.
Buranawong, A., Witit-anun, N., & Chaiyakun, S. (2012). Total pressure and annealing temperature effects on structure and photo-induce hydrophilicity of reactive DC sputtered TiO2 thin films. Engineering Journal, 16(3), 79-89.
Choeysuppaket, A., Chaiyakun, S., & Rattana, T. (2018). Effect of tungsten sputtering current on structural and morphological properties of WC thin films. SNRU Journal of Science and Technology, 10(1), 82-86.
Fan, J. C. C. (1981). Sputtered films for wavelength-selective applications. Thin Solid Films, 80, 125-136.
Fujishima, A., & Honda, K. (1972). Electrochemical photolysis of water at a semiconductor electrode. Nature, 238, 37-38.
Fujishima, A., Rao, T. N., & Tryk, D. A. (2000). TiO2 photocatalysts and diamond electrode. Electrochimica Acta, 45, 4683-4690.
Horprathum, A., Eiamchai, P., Chindaudom, P., Pokaipisit, A., & Limsuwan, P. (2012). Oxygen partial pressure dependence of the properties of TiO2 thin films deposited by DC reactive magnetron sputtering. Procedia Engineering, 32, 676-682.
Leasen, S., & Boonyopakorn, N. (2017). The effect of RF power on crystal structure and electrical properties of aluminum-doped zinc oxide films prepared by RF magnetron sputtering technique. RMUTSB Acad. J., 5(2), 129-135. (in Thai)
Li, G. H., Yang, L., Jin, Y. X., & Zhang, L. D. (2000). Structural and optical properties of TiO2 Thin film and TiO2 + 2 wt.% ZnFe2O4 composite film prepared by r.f. sputtering. Thin Solid Films, 368, 163-167.
Mardare, D., Tasca, M., Delibas, M., & Rusu, G. I. (2000). On the structural properties and optical transmittance of TiO2 r.f. sputtered thin films. Applied Surface Science, 156, 200-206.
Pulker, H. K. (1999). Coatings on glass. Amsterdam: Elsevier Science Publishers B.V.
Ratova, M., Klaysri, R., Praserthdam, P., & Kelly, P. J. (2017). Pulsed DC magnetron sputtering deposition of crystalline photocatalytic titania coatings at elevated process pressures. Materials Science in Semiconductor Processing, 71, 188-196.
Ritter, E. (1975). Dielectric film materials for optical applications. In G. Hass, M. H. Franscombe, & R. W. Hoffman (Eds.), Physics of Thin Films, Vol. 8, New York: Academic Press.
Swanepoel, R. (1983). Determination of the thickness and optical constants of amorphous silicon. Journal of Physics E, 16, 1214-1222.
Tang, H., Prasad, K., Sanjine, R., Schmid, P. E., & Lévy, F. (1994). Electrical and optical properties of TiO2 anatase thin films. Journal of Applied Physics, 75, 2042-2047.
Tauc, J. (1972). Optical properties of solids. Amsterdam: North-Holland.
Thornton, J. A., (1978). Substrate heating in cylindrical magnetron sputtering sources. Thin Solid Films, 54(1), 23-31.
Wang. R., Sakai, N., Fujishima, A., Watanabe, T., & Hashimoto, K. (1999). Studies of surface wettability conversion on TiO2 single-crystal surfaces. Journal of Physical Chemistry B, 103, 2188-2194.
Yamagishi, M., Kuriki, S., Song, P. K., & Shigesato, Y. (2003). Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering. Thin Solid Films, 442, 227-231.
Zhou, W., Zhong, X. X., Wu, X. C., Yuan, L. G., Shu, Q. W., & Xia, Y. X. (2006). Structural and optical properties of titanium oxide thin films deposited on unheated substrate at different total pressures by reactive dc magnetron sputtering with a substrate bias. Korean Physical Society, 49, 2168-2175.