ผลของกำลังไฟฟ้าต่อโครงสร้างของฟิล์มบางเซอร์โคเนียม ไททาเนต ที่เคลือบด้วยวิธีดีซี แมกนีตรอน โคสปัตเตอริง
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Abstract
Abstract
Zirconium titanate (ZrTiO4) thin films were deposited on glass slides, stainless steel and silicon wafer by DC reactive magnetron co-sputtering method. The effect of powers on the structure of the films were investigated. The crystal structure was characterized by XRD. The surface morphologies and thickness were evaluated by AFM and FE-SEM respectively. The results show that the films coated with crystalline increase the power (Zr : Ti). When Zirconium titanate thin films were coated at low powers, found that films have an amorphous structure. After the power increased (Zr : Ti) up to 900 : 1200 without heating the film has an orthogonal crystalline planar structure (111) corresponds to the thickness and roughness of the films. When increased power (Zr : Ti), the coated film has increase thickness and decrease roughness because of the high-energy coating process.
Keywords: thin film; zirconium titanate; power; sputtering
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References
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