Metal Mirror Coating by Sputtering

Authors

  • Sirichai Prasertwong Dept. of Physics, Faculty of Science, Kasetsart University, Bangkok 10900, Thailand.
  • Suthee Hongsumalya Dept. of Physics, Faculty of Science, Kasetsart University, Bangkok 10900, Thailand.

Abstract

A diode sputterer has been designed and constructed. It could coat metal film on a conducting substrate at 0.75 torr with optimum electrodes spacing of 1.7 cm. The rate of coating was 87 ug/min.

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Published

1990-09-30

How to Cite

Sirichai Prasertwong, and Suthee Hongsumalya. 1990. “Metal Mirror Coating by Sputtering”. Agriculture and Natural Resources 24 (3). Bangkok, Thailand:357-66. https://li01.tci-thaijo.org/index.php/anres/article/view/242228.

Issue

Vol. 24 No. 3 (1990): July-September

Section

Research Article

License

online 2452-316X print 2468-1458/Copyright © 2022. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/),
production and hosting by Kasetsart University of Research and Development Institute on behalf of Kasetsart University.