Metal Mirror Coating by Sputtering

ผู้แต่ง

  • Sirichai Prasertwong Dept. of Physics, Faculty of Science, Kasetsart University, Bangkok 10900, Thailand.
  • Suthee Hongsumalya Dept. of Physics, Faculty of Science, Kasetsart University, Bangkok 10900, Thailand.

บทคัดย่อ

A diode sputterer has been designed and constructed. It could coat metal film on a conducting substrate at 0.75 torr with optimum electrodes spacing of 1.7 cm. The rate of coating was 87 ug/min.

ดาวน์โหลด

เผยแพร่แล้ว

1990-09-30

รูปแบบการอ้างอิง

Sirichai Prasertwong, และ Suthee Hongsumalya. 1990. “Metal Mirror Coating by Sputtering”. Agriculture and Natural Resources 24 (3). Bangkok, Thailand:357-66. https://li01.tci-thaijo.org/index.php/anres/article/view/242228.

ฉบับ

ปีที่ 24 ฉบับที่ 3 (1990): July-September

ประเภทบทความ

Research Article

สัญญาอนุญาต

online 2452-316X print 2468-1458/Copyright © 2022. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/),
production and hosting by Kasetsart University of Research and Development Institute on behalf of Kasetsart University.